Tech Next Lab (TNL) provides specific deposition reactor based epitaxial growth modeling services as listed below;


CVD Reactor
  • Si, SiGe, SiC, Diamond etc epitaxial growth modeling at atomistic scale
    • MOCVD Reactor (Showerhead)
    Vertical precursors flow reactor architecture based group III-V nitride, arsenide and antimonide materials epitaxial growth.
    MOCVD Reactor (Injector)
  • Horizontal precursors flow reactor architecture based group III-V nitride, arsenide and antimonide materials epitaxial growth.
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    MBE Reactor
  • Defect modeling with optimization of input parameters
    • Defect modeling
  • Dinstinction between types of defects and their densities with exact location in the lattice
    • LASER
  • Regrowth over patterned substrate with void dimensions modeling, calibration of emitting wavelengths
  • Surface emitting LASER epitaxial growth etc.
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